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DB550 Ga+ Focused Ion Beam Field Emission Scanning Electron Microscope
The DB550 integrates a Ga+ Focused Ion Beam (FIB) column with a Field Emission SEM, featuring "Super Tunnel" electron optics (low aberration, magnetic-free lens), 3nm@30kV ion resolution, and 0.9nm@15kV SEM resolution. It includes a nanomanipulator (≤10nm precision), gas injection system (single GIS, ±0.1°C temp control), and 8-inch compatible loadlock. Ideal for nano-fabrication, semiconductor failure analysis, and materials characterization with automated workflows and expandable detectors (EDS/EBSD/STEM).
DB550 Ga+ Focused Ion Beam Field Emission Scanning Electron Microscope Integrated FIB-SEM workstation Super Tunnel electron opticsSend Email Details -
HEM6000 High-Speed Scanning Electron Microscope
High - speed Scanning Driver Dwell time: 10 ns/pixel; Maximum acquisition speed: 2×100M pixel/s Electron Filtering System SE/BSE signals can be freely switched, and the mixing ratio of signals is adjustable. All - electrostatic High - speed Deflection System It can realize high - resolution large - field mode. With 4 nm pixel size, the maximum field of view reaches 32 μm×32 μm. Sample Stage Deceleration Technology It reduces the landing voltage of incident electrons and simultaneously improves the collection efficiency of recycled electrons. Immersion Electromagnetic Compound Objective Lens The objective lens magnetic field immerses the sample, achieving low aberration and high resolution.
HEM6000 High-Speed Scanning Electron Microscope Industrial SEM for Semiconductor Inspection Low-Voltage High-Resolution SEMSend Email Details
